Non-chemically amplified EUV resist based on PHS

Journal of Photopolymer Science and Technology

Volumn 22, Issue 1, 2009, Pages 111-116

  Shirai, Masamitsu ^a   Maki, Koichi ^a   Okamura, Haruyuki ^a   Kaneyama, Koji ^b   Itani, Toshiro ^b  

^a Osaka Prefecture University   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; Negative resist; Non CA resist; PHS; Thiol ene reaction

Indexed keywords

EID: 70249122767     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.111     Document Type: Article

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