Exposure of molecular glass resist by e-beam and EUVIL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Vannuffel, Cyril ^a   Djian, Damien ^a   Tedesco, Serge ^a   Niakoula, Dimitra ^b   Argitis, Panagiotis ^b   Vidali, Veroniki P ^b   Couladouros, Elias A ^b   Solak, Harun ^c  

^a CEA LETI   (France)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^c PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; LITHOGRAPHY; MOLECULAR STRUCTURE;

DENSE LINES RESOLUTION; E BEAM; MOLECULAR GLASS; MOLECULAR RESIST;

GLASS;

EID: 35148882595     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714263     Document Type: Conference Paper

References (9)

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