XHR SEM: Enabling extreme high resolution scanning electron microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7378, Issue , 2009, Pages

  Young, Richard ^a   Henstra, Sander ^a   Chmelik, Jarda ^b   Dingle, Trevor ^a   Mangnus, Albert ^a   Van Veen, Gerard ^a   Gestmann, Ingo ^a  

^a Thermo Fisher Scientific   (United States)

^b FEI Czech Republic sro   (Czech Republic)

Author keywords

Chromatic aberration; Energy spread; Low voltage; Monochromator; SEM; Surface sensitivity

Indexed keywords

CHROMATIC ABERRATION; ENERGY SPREAD; LOW VOLTAGE; SEM; SURFACE SENSITIVITY;

ABERRATIONS; ELECTRON BEAMS; MONOCHROMATORS; SCANNING; SCANNING ELECTRON MICROSCOPY;

HIGH RESOLUTION ELECTRON MICROSCOPY;

EID: 70049106811     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824749     Document Type: Conference Paper

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