Developing an aberration-corrected Schottky emission SEM and method for measuring aberration

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1017-1020

  Kawasaki, Takeshi ^a   Nakano, Tomonori ^a   Hirose, Kotoko ^a  

^a HITACHI LTD   (Japan)

Author keywords

Aberration correction; Schottky emission; SEM

Indexed keywords

ABERRATION CORRECTION; MAGNIFICATION IMAGES; SCANNING ELECTRON MICROSCOPES; SCHOTTKY EMISSION; SEM;

SCANNING ELECTRON MICROSCOPY;

ABERRATIONS;

EID: 67349131852     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.083     Document Type: Article

References (9)

1. Zach J., and Haider M. Nucl. Instr. Meth. A 363 (1995) 316-325
2. Kazumori H., Honda K., Matsuya M., and Date M. Proc. 8APEM (2004) 52-53
3. Maas D., Bosch E., Horikx J., Mentink S., and Henstra S. Proc. CPO-7 (2006) 84-85
4. Uno S., Honda K., Nakamura N., Matsuya M., and Zach J. Optik 116 (2005) 438-448
5. S. Babin, M. Machin, A. Martynov, H.W.P. Koops, MNE07 Abstracts (2007) 239-240.
6. Typke D., and Dierksen K. Optik 99 (1995) 155-166
7. Meyer R.R., Kirkland A.I., and Saxton W.O. Ultramicroscopy 99 (2004) 115-123
8. Ishitani T., and Sato M. J. Electron. Microsc. 51 (2002) 369-382
9. Rose H. Optik 33 (1971) 1-24