E-beam shot count estimation at 32 nm HP and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Choi, Jin ^a   Lee, Sang Hee ^a   Nam, Dongseok ^a   Kim, Byung Gook ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

E beam writer; Photomask; Writing time

Indexed keywords

32-NM NODE; ADVANCED LITHOGRAPHY; COUNT ESTIMATION; E-BEAM WRITER; HIGH DOSE; NUMBER OF SHOTS; TIME ISSUES; WRITING TIME;

LITHOGRAPHY; PARAMETER ESTIMATION; PHOTOMASKS;

TECHNOLOGY;

EID: 69949147296     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824284     Document Type: Conference Paper

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