Manufacturability study of masks created by Inverse Lithography Technology (ILT)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Martin, Patrick M ^a   Progler, C J ^a   Xiao, G ^a   Gray, R ^a   Pang, L ^b   Liu, Y ^b  

^a PHOTRONICS INC   (United States)

^b Luminescent Technologies Inc   (United States)

Author keywords

Inverse Lithography Technology (ILT); Lithography; Mask inspection; Mask metrology; Mask repair; Mask writing; OPC; RET; VSB

Indexed keywords

INVERSE LITHOGRAPHY TECHNOLOGY (ILT); MASK INSPECTION; MASK WRITING;

INSPECTION; LITHOGRAPHY;

MASKS;

EID: 33644582753     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633200     Document Type: Conference Paper

References (6)

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2. STARLightcan be claimed as a trademark by KLA-Tencor Corporation, see www.KLA-Tencor.com
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