Effects of substrate temperature and post-annealing on microstructure and properties of (AlCrNbSiTiV)N coatings

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 180-184

  Huang, Ping Kang ^a   Yeh, Jien Wei ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

High Entropy Nitride; Magnetron Sputtering; Multi Element Nitrides; Nanocrystallites; X ray diffraction

Indexed keywords

CHEMICAL COMPOSITIONS; COMPRESSIVE RESIDUAL STRESS; CRYSTALLINE STRUCTURE; FACE-CENTERED CUBIC; GRAIN SIZE; HIGH-ENTROPY NITRIDE; LATTICE PARAMETERS; MICROSTRUCTURE AND MECHANICAL PROPERTIES; MICROSTRUCTURE AND PROPERTIES; MULTI-COMPONENT COATINGS; MULTI-ELEMENT NITRIDES; NITRIDE FILMS; POST ANNEALING; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; THERMAL STABILITY;

ANNEALING; CHROMIUM; DIFFRACTION; GRAIN SIZE AND SHAPE; HARD COATINGS; HARDNESS; LATTICE CONSTANTS; MAGNETRONS; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOCRYSTALLITES; NIOBIUM; RESIDUAL STRESSES; SODIUM CHLORIDE; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

NITRIDES;

EID: 69849083223     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.020     Document Type: Article

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