Nanostructured nitride films of multi-element high-entropy alloys by reactive DC sputtering

Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 193-200

  Chen, T K ^a   Shun, T T ^b   Yeh, J W ^c   Wong, M S ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Amorphous nitride film; High entropy alloy; Multi element film; Nanostructured nitride film; Reactive DC sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENTROPY; IRON; NANOSTRUCTURED MATERIALS; NITRIDES; SPUTTERING; SURFACE ROUGHNESS;

NANOSTRUCTURED NITRIDE FILMS; NITROGEN GAS FLOW; REACTIVE SPUTTERING;

THIN FILMS;

ALLOY; DIAMOND COATING; FILM; GAS FLOW; NANOSTRUCTURE; PROCESSING TECHNIQUE;

EID: 14644412886     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.023     Document Type: Article

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