SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1361-1365

Nanostructured nitride films of multi-element high-entropy alloys by reactive DC sputtering

(4) Chen, Ta Kun a Wong, Ming Show a Shun, Tao Tsung b Yeh, Jien Wei c

a NATIONAL DONG HWA UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

c NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

AlCoCrCuFeNi; AlCrNiSiTi; Amorphous alloy; Multi component nitride; Multi element alloy; Nanostructured film

Indexed keywords

ALUMINUM ALLOYS; AMORPHOUS ALLOYS; ATOMIC FORCE MICROSCOPY; FIELD EMISSION MICROSCOPES; FILMS; HARDNESS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MULTI-COMPONENT NITRIDE; MULTI-ELEMENT ALLOY; NANOSTRUCTURED FILM; NANOSTRUCTURED METALLIC FILMS; REACTIVE SPUTTERING;

NITRIDES;

COATING;

EID: 28844448322 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.08.081 Document Type: Article

Times cited : (180)

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