Simplified procedure for patterned growth of nanocrystalline diamond micro-structures

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 343-347

  Kromka, Alexander ^a   Babchenko, Oleg ^a   Rezek, Bohuslav ^a   Ledinsky, Martin ^a   Hruska, Karel ^a   Potmesil, Jiri ^a   Vanecek, Milan ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Atomic force microscopy; Nanocrystalline diamond; Patterning; Raman spectroscopy; Seed layer; Selective diamond growth

Indexed keywords

COMPACT GROWTH; DIAMOND GROWTH; IV CHARACTERISTICS; LITHOGRAPHIC PATTERNING; METAL MASKS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; NANOCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMONDS; NARROW CHANNEL; PATTERNED GROWTH; PATTERNING; SEED LAYER; SEEDING LAYERS; SELECTIVE DIAMOND GROWTH; SIMPLIFIED PROCEDURE; SURFACE CONDUCTIVITY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; ELECTRIC CONDUCTIVITY; MICROWAVES; NANOCRYSTALLINE MATERIALS; PLASMA DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY;

DIAMONDS;

EID: 69749104314     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.014     Document Type: Article

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