Effects of N2 addition on nanocrystalline diamond films by HFCVD in Ar/CH4 gas mixture

Current Applied Physics

Volumn 10, Issue 1, 2010, Pages 171-175

  Rakha, Sobia Allah ^a   Xintai, Zhou ^a   Zhu, Dezhang ^a   Guojun, Yu ^a  

^a SHANGHAI INSTITUTE OF APPLIED PHYSICS   (China)

Author keywords

Diamond films; Electron microscopy; Hot filament CVD; Nanocrystalline

Indexed keywords

BONDING NATURE; CONCENTRATION OF; DEPOSITED FILMS; GRAIN SIZE; GRAPHITE CONTENT; HOT FILAMENT CVD; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; NANO GRAINS; NANOCRYSTALLINE; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE FILMS; NANOSIZED DIAMONDS; NCD FILMS; NITROGEN INCORPORATION; RAMAN SPECTRA; RELATIVE INTENSITY; SEEDING PROCESS; SILICON SUBSTRATES; TOTAL GAS PRESSURE; X-RAY DIFFRACTION MEASUREMENTS; XRD MEASUREMENTS;

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLITE SIZE; DIAMOND CUTTING TOOLS; DIAMONDS; ELECTRON MICROSCOPES; FILAMENTS (LAMP); GAS MIXTURES; GRAPHITE; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE SILICON; NITROGEN; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

DIAMOND FILMS;

EID: 69249215319     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.05.014     Document Type: Article

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