Diamond nucleation and growth by hot-filament CVD with in situ DC glow discharge at a lower deposition pressure

Materials Letters

Volumn 41, Issue 5, 1999, Pages 261-265

  Zhang, G F ^a   Buck, V ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; ELECTRIC POTENTIAL; GLOW DISCHARGES; NUCLEATION; PRESSURE EFFECTS; SILICON; SUBSTRATES;

HOT-FILAMENT CHEMICAL VAPOR DEPOSITION (CVD);

DIAMOND FILMS;

EID: 0033335625     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(99)00140-8     Document Type: Article

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