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Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3160-3165

Low temperature growths of nanocrystalline diamond films by plasma-assisted hot filament chemical vapor deposition

(2) Huang, Shr Ming a Hong, Franklin Chau Nan a

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Double bias; High growth rate; Hot filament chemical vapor deposition (HFCVD); Nanocrystalline diamond (NCD) film; Negative substrate bias; Plasma

Indexed keywords

FILM GROWTH; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

HIGH GROWTH RATE; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); NANOCRYSTALLINE DIAMOND (NCD) FILM; NEGATIVE SUBSTRATE BIAS;

DIAMOND FILMS;

DIAMOND FILMS; FILM GROWTH; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 31644437325 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.07.035 Document Type: Article

Times cited : (12)

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