Low temperature growth of highly transparent nanocrystalline diamond films on quartz glass by hot filament chemical vapor deposition

Diamond and Related Materials

Volumn 18, Issue 2-3, 2009, Pages 155-159

  You, Min Sheng ^a   Hong, Franklin Chau Nan ^a   Jeng, Yeau Ren ^b   Huang, Shih Ming ^c  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHUNG CHENG UNIVERSITY   (Taiwan)

^c Creating Nano Technologies Inc   (Taiwan)

Author keywords

Hot filment CVD; Low temperature; Nanocrystalline diamond; NCD; Transmittance

Indexed keywords

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILAMENTS (LAMP); FILM GROWTH; GLASS; GRAIN GROWTH; GRAPHITE; GROWTH (MATERIALS); HARDNESS; HYDROGEN; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; OPTICAL PROPERTIES; OXIDE MINERALS; QUARTZ; SUBSTRATES; SURFACE ROUGHNESS; VAPORS;

HOT-FILMENT CVD; LOW TEMPERATURE; NANOCRYSTALLINE DIAMOND; NCD; TRANSMITTANCE;

DIAMOND FILMS;

EID: 59649087653     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.07.015     Document Type: Article

References (21)

1. Davis R.F. Diamond Films and Coatings (1992), Noyes publication, Park Ringe, New Jersey, USA 3-28
2. Koslowski B., Strobel S., and Ziemann P. Diamond Relat. Mater. 9 (2000) 1159-1163
3. Rawles R.E., Komarov S.F., Gat R., Morris W.G., Hudson J.B., and D'Evelyn M.P. Diamond Relat. Mater. 6 (1997) 791-0035
4. Bushan B., Subramaniam V.V., Malshe A., Kupka B.K., and Ruan J. J. Appl. Phys. 74 (1993) 4174-4180
5. Chen L.C., Kichambare P.D., Chen K.H., Wu J.J., Yang J.R., and Lin S.T. J. Appl. Phys. 89 (2001) 753-759
6. Ong T.P., and Chang R.P.H. Appl. Phys. Lett. 55 (1989) 2063-2065
7. Wu R.L.C., Rai A.K., Garscadden A., Kee P., Desai H.D., and Miyoshi K. J. Appl. Phys. 72 (1992) 110-116
8. Sharda T., Rahaman M.M., Nukaya Y., Soga T., Jimbo T., and Umeno M. Diamond Relat. Mater. 10 (2001) 561-567
9. Yang W.B., Lü F.X., and Cao Z.X. J. Appl. Phys. 91 (2002) 10068-10073
10. Chen K.H., Bhusari D.M., Yang J.R., Lin S.T., Wang T.Y., and Chen L.C. Thin Solid Films 332 (1998) 34-39
11. Remes Z., Avigal Y., Kalish R., et al. Phys. Status Solidi, A Appl. Res. 201 (2004) 2499-2502
12. Schäfer L., Klages C.P., Meier U., and Kohse-Höinghaus K. Appl. Phys. Lett. 58 (1991) 571-573
13. Chen K.H., Chuang M.C., Murray Penney C., and Banholzer W.F. J. Appl. Phys. 71 (1992) 1485-1493
14. Connell L.L., Fleming J.W., Chu H.N., Vestyck Jr. D.J., Jensen E., and Butler J.E. J. Appl. Phys. 78 (1995) 3622-3634
15. Celii F.G., and Butler J.E. Appl. Phys. Lett. 54 (1989) 1031-1033
16. Sharda T., Misra D.S., Avasthi D.K., and Mehta G.K. Solid State Commun. 98 (1996) 879-883
17. Huang S.M., and Hong F.C.N. Surf. Coat. Technol. 200 (2006) 3160-3165
18. Wu J.J., and Hong F.C.N. Appl. Phys. Lett. 70 (1997) 185-187
19. Hong F.C.N., and Wu J.J. Appl. Phys. Lett. 63 (1993) 3149-3151
20. Vietzke E., Philipps V., Flaskamp K., Koidl P., and Wild C.H. Surf. Coat. Technol. 47 (1991) 156-161
21. Liou Y., Inspektor A., Weimer R., and Messier R. Appl. Phys. Lett. 55 (1989) 631-633