Electrical contacts to nitrogen incorporated nanocrystalline diamond films

Diamond and Related Materials

Volumn 17, Issue 12, 2008, Pages 2037-2040

  Jeedigunta, Sathyaharish ^a,c   Spagnol, Priscila ^b   Bumgarner, John ^b   Kumar, Ashok ^b,c  

^a Department of Electrical Engineering ^*  (United States)

^b SRI INTERNATIONAL   (United States)

^c UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

CVD diamond; Ohmic contacts; Plasma treatment

Indexed keywords

ANNEALING; CURRENT VOLTAGE CHARACTERISTICS; DIAMONDS; ELECTRIC CONTACTS; HYDROGEN; MICROWAVES; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NITROGEN; OHMIC CONTACTS; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SURFACE DEFECTS; SURFACE TREATMENT;

BONDING CONFIGURATIONS; CVD DIAMOND; ELECTRICAL CONTACTS; GAS CHEMISTRIES; HYDROGEN PLASMAS; LINEAR CURRENTS; METAL ELECTRODES; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; NCD FILMS; PATTERNING; PLASMA TREATMENT; PLASMA TREATMENTS; RAMAN SPECTRUM; SURFACE CONDITIONS; SURFACE PLASMA TREATMENTS; SURFACE PLASMAS; VOLTAGE CHARACTERISTICS;

DIAMOND FILMS;

EID: 54049158025     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.06.012     Document Type: Article

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