Effect of DC bias on microstructural rearrangement of a-SiN:H films on PET substrate

Applied Surface Science

Volumn 255, Issue 23, 2009, Pages 9391-9395

  Swain, Bibhu P ^a   Swain, Bhabani S ^a   Hwang, Nong M ^a  

^a Seoul National University   (South Korea)

Author keywords

a SiN:H; FESEM; HWCVD; Raman; SAXS

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FRACTALS; INTERFACES (MATERIALS); PLASTIC BOTTLES; SILICON NITRIDE; SURFACE ROUGHNESS; X RAY SCATTERING;

A-SIN:H; FESEM; HWCVD; RAMAN; SAXS;

SUBSTRATES;

EID: 69249203479     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.07.041     Document Type: Article

References (14)

1. Swain B.P., Swain B.S., and Hwang N.M. Appl. Surf. Sci. 255 (2008) 2557
2. Masuda A., Umemoto H., and Matsumura H. Thin Solid Films 501 (2006) 149
3. Heya A., Minamikawa T., Niki T., Minami S., Masuda A., Umemoto H., Matsuo N., and Matsumura H. Thin Solid Films 516 (2008) 553
4. Wuu D.S., Lo W.C., Chiang C.C., Lin H.B., Chang L.S., Horng R.H., Huang C.L., and Gao Y.J. Surf. Coat. Technol. 198 (2005) 114
5. Chen T.N., Wuu D.S., Wu C.C., Chiang C.C., Lin H.B., Chen Y.P., and Horng R.H. Thin Solid Films 514 (2006) 188
6. Tiwari S.P., Srinivas P., Shriram S., Kale N.G., Mhaisalkar S.G., and Ramgopal Rao V. Thin Solid Films 516 (2008) 770
7. Matsumoto M., Suemitsu M., Yara T., Nakajima S., Uehara T., Toyoshima Y., and Itou S. ECS Trans. 3 (2006) 119
8. Wang M., Diao X.G., Huang A.P., Chu P.K., and Wu Z. Surf. Coat. Technol. 201 (2007) 6777
9. Tzenov N.V., Tzolov M.B., and Malinovka D.I.D. Semicond. Sci. Technol. 9 (1994) 91
10. Inukai T., and Ono K. J. Appl. Phys. 33 (1994) 2593
11. Li T., and Kanki J. Appl. Phys. Lett. 73 (1998) 3866
12. Swain B.P., and Dusane R.O. Mater. Lett. 60 (2006) 2915
13. Tyagi D., Mcgrath J.E., and Wilkes G.L. Polym. Eng. Sci. 26 (1986) 1137
14. Swain B.P. Mater. Lett. 60 (2006) 2767