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Volumn 3, Issue 8, 2006, Pages 119-124

Deposition of highly crystallized poly-Si thin films on polymer substrates using pulsed-plasma CVD under near-atmospheric pressure

(7) Matsumoto, M a Suemitsu, M a Yara, T b Nakajima, S b Uehara, T b Toyoshima, Y c Itou, S d

a TOHOKU UNIVERSITY (Japan)

b SEKISUI CHEMICAL CO LTD (Japan)

c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

d TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; POLYSILICON; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

GLASS SUBSTRATE; INCUBATION LAYERS; RAMAN SCATTERING SPECTROSCOPY;

THIN FILMS;

EID: 33846957171 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.2356344 Document Type: Conference Paper

Times cited : (5)

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