SCOPUS 정보 검색 플랫폼

Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 114-117

Water and oxygen permeation of silicon nitride films prepared by plasma-enhanced chemical vapor deposition

Author keywords

Permeation; Plasma processing and deposition; Polymers; Silicon nitride

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COATINGS; OXYGEN; REFRACTIVE INDEX; SILICON NITRIDE;

DEPOSITION RATE; OXYGEN TRANSMISSION RATE (OTR); POLYETHERSULFONE (PES); WATER VAPOR TRANSMISSION RATE (WVTR);

THIN FILMS;

SILICON NITRIDE;

EID: 20744436683 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.10.034 Document Type: Article

Times cited : (58)

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