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Volumn 32, Issue 3, 2009, Pages 657-665

Vertical integration of stacked DRAM and high-speed logic device using SMAFTI technology

Author keywords

Bump interconnection; Fine interposer; Stacked memory; Three dimensional LSI; Through silicon vias (TSVs)

Indexed keywords

BUMP INTERCONNECTION; FINE INTERPOSER; STACKED MEMORY; THREE-DIMENSIONAL LSI; THROUGH-SILICON VIAS (TSVS);

EID: 68949175484     PISSN: 15213323     EISSN: None     Source Type: Journal    
DOI: 10.1109/TADVP.2009.2015461     Document Type: Article
Times cited : (48)

References (16)
  • 2
    • 33750592887 scopus 로고    scopus 로고
    • Three-dimensional integration technology based on wafer bonding with vertical buried interconnections
    • Nov
    • M. Koyanagi, T. Nakamura, Y. Yamada, H. Kikuchi, T. Fukushima, T. Tanaka, and H. Kurino, "Three-dimensional integration technology based on wafer bonding with vertical buried interconnections," IEEE Trans. Electron. Devices, vol. 53, no. 11, pp. 2799-2808, Nov. 2006.
    • (2006) IEEE Trans. Electron. Devices , vol.53 , Issue.11 , pp. 2799-2808
    • Koyanagi, M.1    Nakamura, T.2    Yamada, Y.3    Kikuchi, H.4    Fukushima, T.5    Tanaka, T.6    Kurino, H.7
  • 6
    • 33847732625 scopus 로고    scopus 로고
    • New threedimensional integration technology using self-assembly technique
    • Dec
    • T. Fukushima, Y. Yamada, H. Kikuchi, and M. Koyanagi, "New threedimensional integration technology using self-assembly technique," in IEDM Tech. Dig., Dec. 2005, pp. 348-351.
    • (2005) IEDM Tech. Dig , pp. 348-351
    • Fukushima, T.1    Yamada, Y.2    Kikuchi, H.3    Koyanagi, M.4
  • 16
    • 24644443368 scopus 로고    scopus 로고
    • Effect of the Cu thickness on the stability of a Ni/Cu bilayer UBM of lead free microbumps during liquid and solid state aging
    • Orlando, FL, May/Jun
    • C. Jurenka, J. Y. Kim, M. J. Wolf, G. Engelmann, O. Ehrmann, J. Yu, and H. Reichl, "Effect of the Cu thickness on the stability of a Ni/Cu bilayer UBM of lead free microbumps during liquid and solid state aging," in Proc. 55th Electric Compon. Technol.Conf. (ECTC 2005 , Orlando, FL, May/Jun. 2005, pp. 89-93.
    • (2005) Proc. 55th Electric Compon. Technol.Conf. (ECTC 2005 , pp. 89-93
    • Jurenka, C.1    Kim, J.Y.2    Wolf, M.J.3    Engelmann, G.4    Ehrmann, O.5    Yu, J.6    Reichl, H.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.