OLED substrate conditioning by low power density RF plasmas

Surface and Coatings Technology

Volumn 204, Issue 1-2, 2009, Pages 99-107

  Svarnas, P ^a   Bradley, J W ^a   Shard, A G ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Ion flux; OES; OLED; RF plasmas; Wettability

Indexed keywords

ION FLUX; OES; OLED; RF PLASMAS; WETTABILITY;

CELL MEMBRANES; CONDUCTIVE FILMS; CONTACT ANGLE; EMISSION SPECTROSCOPY; HELMET MOUNTED DISPLAYS; INDIUM; LEAKAGE (FLUID); LIGHT TRANSMISSION; MULTIPHOTON PROCESSES; OPTICAL EMISSION SPECTROSCOPY; ORGANIC LIGHT EMITTING DIODES (OLED); OXIDE FILMS; OXYGEN; PHOTOLITHOGRAPHY; PLASMA THEORY; SURFACE DISCHARGES; TIN; WAVE PLASMA INTERACTIONS;

IONS;

EID: 68549126726     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.06.034     Document Type: Article

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