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Volumn 44, Issue 2, 2005, Pages 1041-1044

Surface characteristics of indium-tin oxide cleaned by remote plasma

Author keywords

Contaminants; ITO; Remote plasma; Sheet resistance; Work function

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CLEANING; IMPURITIES; PLASMAS; REDUCTION; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE (ITO); REMOTE PLASMA; SHEET RESISTANCE; WORK FUNCTION;

INDIUM COMPOUNDS;

EID: 17444420843 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.44.1041 Document Type: Article

Times cited : (7)

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