Surface treatment and characterization of ITO thin films using atmospheric pressure plasma for organic light emitting diodes

Journal of Colloid and Interface Science

Volumn 310, Issue 2, 2007, Pages 550-558

  Jung, Mi Hee ^a   Choi, Ho Suk ^a  

^a Chungnam National University   (South Korea)

Author keywords

Atmospheric pressure plasma; Atomic force microscopy; Contact angle; Hysteresis; Indium tin oxide; Low pressure plasma; Organic light emitting diodes; Surface free energy; X ray photoelectron spectroscopy

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA; INDIUM TIN OXIDE; LOW PRESSURE PLASMA; SURFACE FREE ENERGY;

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; FREE ENERGY; HYSTERESIS; INDIUM COMPOUNDS; ORGANIC LIGHT EMITTING DIODES (OLED); PLASMA SOURCES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

CARBON; ETHYLENE GLYCOL; INDIUM TIN OXIDE; IODINE DERIVATIVE; METAL DERIVATIVE; METHYLENE IODIDE; OXYGEN; OXYGEN DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; HYSTERESIS; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34247473299     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2007.02.011     Document Type: Article

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