Advances in Boltzmann equation based modelling of discharge plasmas

Plasma Sources Science and Technology

Volumn 18, Issue 3, 2009, Pages

  Loffhagen, D ^a   Sigeneger, F ^a  

^a INP GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMN PLASMA; DISCHARGE PLASMA; FLUID DESCRIPTION; GAS-DISCHARGE PLASMAS; GLOW DISCHARGE PLASMAS; HYBRID APPROACH; HYBRID METHOD; KINETIC EQUATIONS; NONISOTHERMAL; NUMERICAL MODELLING; ONE-DIMENSIONAL; PERIODIC EVOLUTION; PLASMA SPECIES; QUASI-STATIONARY; SELF-CONSISTENT DESCRIPTION; SHORT LASER PULSE; SPATIOTEMPORAL EVOLUTION; XE LAMP;

DISTRIBUTION FUNCTIONS; GAS DISCHARGE TUBES; GLOW DISCHARGES; HELIUM; HYBRID SENSORS; INERT GASES; INTEGRAL EQUATIONS; KINETIC ENERGY; KINETIC THEORY; KINETICS; NEON; NUMERICAL METHODS; PLASMA THEORY; PULSED LASER APPLICATIONS; VELOCITY CONTROL; XENON;

BOLTZMANN EQUATION;

EID: 68549125358     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/3/034006     Document Type: Article

References (104)

1. Liebermann M 1988 IEEE Trans. Plasma Sci. 16 638-44
2. Boeuf J and Pitchford L 1995 J. Phys. D: Appl. Phys. 28 2083-8
3. Kolobov V and Tsendin L 1995 Plasma Sources Sci. Technol. 4 551-60
4. Kawamura E, Vahedi V, Lieberman M and Birdsall C 1999 Plasma Sources Sci. Technol. 8 R45-64
5. Golant V E, Zhilinsky A P and Sakharov I E 1980 Fundamentals of Plasma Physics (New York: Wiley)
6. Robson R E, White R D and Petrović Z L 2005 Rev. Mod. Phys. 77 1303-20
7. Ward A L 1958 Phys. Rev. 112 1852-7
8. Ingold J H 1989 Phys. Rev. A 40 3855-63
9. Graves D B and Jensen K F 1986 IEEE Trans. Plasma Sci. 14 78-91
10. Barnes M S, Colter T J and Elta M E 1987 J. Appl. Phys. 61 81-9
11. Boeuf J P 1987 Phys. Rev. A 36 2782-92
12. Kunhardt E E and Wu C 1987 J. Comput. Phys. 68 127-50
13. Richards A D, Thompson B E and Sawin H H 1987 Appl. Phys. Lett. 50 492-4
14. Barnes M S, Colter T J and Elta M E 1988 J. Comput. Phys. 77 53-72
15. Gogolides E, Nicolai J P and Sawin H H 1989 J. Vac. Sci. Technol. A 7 1001-6
16. Okazaki K, Makabe T and Yamaguchi Y 1989 Appl. Phys. Lett. 54 1742-4
17. Meyyappan M and Kreskovsky J P 1990 J. Appl. Phys. 68 1506-12
18. Oh Y H, Choi N H and Choi D I 1990 J. Appl. Phys. 67 3264-8
19. Park S K and Economou D J 1990 J. Appl. Phys. 68 3904-15
20. Gogolides E and Sawin H H 1992 J. Appl. Phys. 72 3971-87
21. Passchier J D P and Goedheer W J 1993 J. Appl. Phys. 73 1073-9
22. Nienhuis G J, Goedheer W J, Hamers E A G, van Sark W G J H M and Bezemer J 1997 J. Appl. Phys. 82 2060-71
23. Boeuf J 1988 J. Appl. Phys. 63 1342-9
24. Wu C and Kunhardt E E 1988 Phys. Rev. A 37 4396-406
25. Tsai J H and Wu C 1990 Phys. Rev. A 41 5626-44
26. Hashiguchi S 1992 J. Vac. Sci. Technol. A 10 1339-43
27. Lymberopoulos D P and Economou D J 1993 Appl. Phys. Lett. 63 2478-80
28. Passchier J D P and Goedheer W J 1993 J. Appl. Phys. 74 3744-51
29. Young F F and Wu C H 1993 IEEE Trans. Plasma Sci. 21 312-21
30. Boeuf J, Belenguer P and Hbid T 1994 Plasma Sources Sci. Technol. 3 407-17
31. Meyyappan M and Govindan T R 1996 IEEE Trans. Plasma Sci. 24 119-20
32. Wilcoxson M H and Manousiouthakis V I 1996 Chem. Eng. Sci. 51 1089-106
33. Kim H C and Manousiouthakis V I 1998 J. Vac. Sci. Technol. 16 2162-72
34. Salabas A, Gousset G and Alves L 2002 Plasma Sources Sci. Technol. 11 448-65
35. Boeuf J P 2003 J. Phys. D: Appl. Phys. 36 R53-79
36. Chung W J, Seo J H and Whang K W 2002 IEEE Trans. Plasma Sci. 30 665-72
37. Kim H C, Hur M S, Yang S S, Shin S W and Lee J K 2002 J. Appl. Phys. 91 9513-20
38. Kolobov V I 2003 Comput. Mater. Sci. 28 302-20
39. Boswell R W and Morey I J 1988 Appl. Phys. Lett. 52 21-3
40. Sommerer T J, Hitchon W N G and Lawler J E 1989 Phys. Rev. Lett. 63 2361-4
41. Birdsall C K 1991 IEEE Trans. Plasma Sci. 19 65-85
42. Surendra M and Graves D 1991 IEEE Trans. Plasma Sci. 19 144-57
43. Boeuf J P and Belenguer P 1992 J. Appl. Phys. 71 4751-4
44. Vahedi V, DiPeso G, Birdsall C K, Lieberman M A and Rognlien T D 1993 Plasma Sources Sci. Technol. 2 261-72
45. Turner M M 2006 Phys. Plasmas 13 033506
46. Vahedi V, Birdsall C K, Lieberman M A, DiPeso G and Rognlien T D 1993 Phys. Fluids B 5 2719-29
47. Yan M and Goedheer W J 1999 Plasma Sources Sci. Technol. 8 349-54
48. Weng Y and Kushner M J 1990 Phys. Rev. A 42 6192-200
49. Hashiguchi S 1991 IEEE Trans. Plasma Sci. 19 297-300
50. Yousfi M, Himondi A and Gaouar A 1992 Phys. Rev. A 46 7889-901
51. Boeuf J P and Pitchford L C 1991 IEEE Trans. Plasma Sci. 19 286-96
52. Sato N and Tagashira H 1991 IEEE Trans. Plasma Sci. 19 102-12
53. Sommerer T J and Kushner M J 1992 J. Appl. Phys. 71 1654-73
54. Fiala A, Pitchford L C and Boeuf J P 1994 Phys. Rev. E 49 5607-22
55. Bogaerts A and Gijbels R 2003 Vacuum 69 37-52
56. Kutasi K, Hartmann P, Bnó G and Donkó Z 2005 Plasma Sources Sci. Technol. 14 S1-8
57. Sigeneger F, Donkó Z and Loffhagen D 2007 Eur. Phys. J. Appl. Phys. 38 161-7
58. Donkó Z, Hartmann P and Kutasi K 2006 Plasma Sources Sci. Technol. 15 178-86
59. Boeuf J P, Punset C, Hirech A and Doyeux H 1997 J. Phys. IV 7 3-14
60. Uhrlandt D and Franke S 2002 J. Phys. D: Appl. Phys. 35 680-8
61. Loffhagen D, Arndt S, Sigeneger F, Uhrlandt D and Winkler R 2005 Contrib. Plasma Phys. 45 309-18
62. Loffhagen D and Winkler R 1994 J. Comput. Phys. 112 91-101
63. Gortchakov S, Loffhagen D and Winkler R 1998 Appl. Phys. B 66 313-21
64. Bräuer T, Gortchakov S, Loffhagen D, Pfau S and Winkler R 1997 J. Phys. D: Appl. Phys. 30 3223-39
65. Bussiahn R, Gortchakov S, Lange H and Loffhagen D 2006 J. Phys. D: Appl. Phys. 39 66-72
66. Bussiahn R, Gorchakov S, Lange H, Loffhagen D and Uhrlandt D 2007 J. Phys. D: Appl. Phys. 40 3882-8
67. Arndt S, Sigeneger F and Winkler R 2003 Plasma Chem. Plasma Process. 23 439-61
68. Arndt S, Sigeneger F, Testrich H and Brandt C 2005 Plasma Chem. Plasma Process. 25 567-94
69. Gortchakov S, Lange H and Uhrlandt D 2003 J. Appl. Phys. 93 9508-15
70. Sigeneger F and Winkler R 2005 Plasma Chem. Plasma Process. 25 147-68
71. Winkler R and Wuttke M W 1992 Appl. Phys. B 54 1-17
72. Loffhagen D 2005 Plasma Chem. Plasma Process. 25 519-38
73. Loffhagen D, Sigeneger F and Winkler R 2008 Low Temperature Plasmas: Fundamentals, Technologies and Techniques vol 1 2nd edn ed R Hippler et al (Weinheim: WILEY-VCH) pp 15-45 chapter 2
74. Wilhelm J and Winkler R 1979 J. Physique Coll. 40 251-67
75. Goedheer W J and Meijer P M 1993 J. Nucl. Mater. 200 282-90
76. Mahmoud M O M and Yousfi M 1997 J. Appl. Phys. 89 5935-43
77. Loffhagen D and Winkler R 2001 J. Phys. D: Appl. Phys. 34 1355-66
78. Loffhagen D and Gorchakov S 2005 Proc. XXVIIth ICPIG (Eindhoven, The Netherlands) pp 03-159 (CD-Rom)
79. Sigeneger F and Winkler R 1999 IEEE Trans. Plasma Sci. 27 1254-61
80. Matsui J, Shibata M, Nakano N and Makabe T 1998 J. Vac. Sci. Technol. A 16 294-99
81. Phelps A V 1959 Phys. Rev. 114 1011-25
82. Viehland L A and Mason E A 1995 Atomic Data Nucl. Data Tables 60 37-95
83. Loffhagen D, Sigeneger F and Winkler R 2002 J. Phys. D: Appl. Phys. 35 1768-76
84. Sukhinin G and Fedoseev A 2006 High Temp. 44 157-65
85. Uhrlandt D, Bussiahn R, Gorchakov S, Lange H, Loffhagen D and Nötzold D 2005 J. Phys. D: Appl. Phys. 38 3318-25
86. Ventzek P, Sommerer T, Hoekstra R and Kushner M 1993 Appl. Phys. Lett. 63 605-7
87. Hagelaar G and Kroesen G 2000 J. Comput. Phys. 159 1-12
88. Alves L L, Gousset G and Ferreira C M 1997 Phys. Rev. E 55 890-906
89. von Rosenberg D U 1969 Methods for the Numerical Solution of Partial Differential Equations (New York: American Elsevier)
90. Holstein T 1951 Phys. Rev. 83 1159-68
91. Igarashi K, Mikoshiba S, Watanabe Y, Suzuki M and Murayama S 1995 J. Phys. D: Appl. Phys. 28 1377-83
92. Blanc A 1908 J. Phys. (Paris) 8 825-39
93. Mason E A and McDaniel E W 1988 Transport Properties of Gaseous Ions in Gases (New York: Wiley)
94. Ellis H W, Pai R Y, McDaniel E W, Mason E A and Viehland L A 1976 Atomic Data Nucl. Data Tables 17 177-210
95. Ellis H W, McDaniel E W, Albritton D L, Viehland L A, Lin S L and Mason E A 1978 Atomic Data Nucl. Data Tables 22 179-217
96. Devyatov A M, Kuzovnikov A, Shaikhitdinov R Z, Shibkov V and Shibkova L V 1981 Proc. XV ICPIG (London, UK) pp 399-400 Part 1
97. Dothan F and Kagan Y M 1979 J. Phys. D: Appl. Phys. 12 2155-66
98. Scharfetter D and Gummel H 1969 IEEE Trans. Electron Devices 16 64-77
99. Bussiahn R, Golubovskii Y B, Lange H and Porokhova I A 2005 J. Phys. D: Appl. Phys. 38 697-702
100. Uhrlandt D and Winkler R 1996 J. Phys D: Appl. Phys. 29 115-20
101. Ingold J H 1997 Phys. Rev. E 56 5932-44
102. Kortshagen U and Lawler J E 1999 J. Phys. D: Appl. Phys. 32 2737-45
103. Uhrlandt D 2002 J. Phys. D: Appl. Phys. 35 2159-68
104. Arndt S C, Uhrlandt D and Winkler R 2001 Plasma Chem. Plasma Process. 21 175-200