Numerical modelling of gas discharge plasmas for various applications

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 37-52

  Bogaerts, Annemie ^a   Gijbels, Renaat ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

Gas discharge; Numerical modelling; Plasma

Indexed keywords

DEPOSITION; ETCHING; MATHEMATICAL MODELS; PROTECTIVE COATINGS;

GAS DISCHARGE PLASMAS;

PLASMAS;

EID: 0037168456     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00306-8     Document Type: Conference Paper

References (72)

1. Lieberman M.A., Lichtenberg A.J. Principles of plasma discharges and materials processing. 1994;Wiley, New York.
2. Grill A. Cold plasma in materials fabrication. from fundamentals to applications:1994;IEEE Press, New York.
3. Lieberman M.A. Plasma discharges for materials processing and display applications. Schlüter H., Shivarova A. Advanced technologies based on wave and beam generated plasmas, NATO Science Series. vol. 67:1999;1-22 Kluwer, Dordrecht.
4. Konuma M. Film deposition by plasma techniques. 1992;Springer, New York.
5. Bruno G, Capezutto P, Madan A, editors. Plasma deposition of amorphous silicon-based materials. San Diego: Academic Press, 1995.
6. Wilhelm R. Deposition properties and applications of carbon-based coatings. Schlüter H., Shivarova A. Advanced technologies based on wave and beam generated plasmas, NATO Science Series. vol. 67:1999;123-135 Kluwer, Dordrecht.
7. Yasuda HK, editors. Plasma polymerization and plasma interactions with polymeric materials. New York: Wiley, 1990.
8. d'Agostino R, editor. Deposition, treatment and etching of polymers. New York: Academic Press, 1990.
9. Marcus R.K. Glow discharge spectroscopies. 1993;Plenum Press, New York.
10. Payling R., Jones D., Bengtson A. Glow discharge optical emission spectrometry. 1997;Wiley, Chichester.
11. Abeywickrama M.G. Fluorescent lamps. Coaton J.R., Marsden A.M. Lamps and lighting. 1997;194-215 Arnold, London.
12. de Groot J., van Vliet J. The high-pressure sodium lamp, Philips technical library. 1986;Kluwer, Deventer.
13. Wharmby D.O. Electrodeless Lamps. Coaton J.R., Marsden A.M. Lamps and lighting. 1997;216-226 Arnold, London.
14. Wilson J., Hawkes J.F.B. Lasers. principles and applications:1987;Prentice-Hall, New York.
15. Ivanov I.G., Latush E.L., Sem M.F. Metal vapor ion lasers. 1996;Wiley, Chichester.
16. Little C.E. Metal vapor lasers. 1999;Wiley, Chichester.
17. Weber L.F. Plasma displays. Tannas L.E. Jr. Flat panel displays and CRTs. 1985;332-414 Van Nostrand Reinhold, New York.
18. Sobel A. Plasma displays. IEEE Trans Plasma Sci. 19:1991;1032-1047.
19. Hammer T. Applications of plasma technology in environmental techniques. Contrib Plasma Phys. 39:1999;441-462.
20. Manheimer W, Sugiyama LE, Stix TH, editors. Plasma science and the environment. Woodbury, NY: American Institute of Physics, 1997.
21. Penetrante BM, Schultheis SE, editors. Non-thermal plasma techniques for pollution control, NATO ASI Series, Series G: Ecological Sciences, vol. 34, Part A&B. Berlin: Springer, 1993.
22. Laroussi M. Sterilization of contaminated matter with an atmospheric pressure plasma. IEEE Trans Plasma Sci. 24:1996;1188-1191.
23. Kelly Winterberg K., Hodge A., Montie T.C., Deleanu L., Sherman D.M., Roth J.R., Tsai P.P.-Y., Wadsworth L.C. Use of a one-atmosphere uniform glow discharge plasma to kill a broad spectrum of micro-organisms. J Vac Sci Technol. 17:1999;1539-1544.
24. Berezhnoi S.V., Kaganovich I.D., Tsendin L.D., Schweigert V.A. Appl Phys Lett. 69:1996;2341.
25. Lee Y.T., Lieberman M.A., Lichtenberg A.J., Bose F., Baltes H., Patrick R. J Vac Sci Technol A. 15:1997;113.
26. Boeuf J.-P. Phys Rev A. 36:1987;2782.
27. Passchier J.D.P., Goedheer W.J. J Appl Phys. 73:1993;1073.
28. van der Sijde B., van der Mullen J.J.A.M., Schram D.C. Beitr Plasmaphys. 24:1984;447.
29. Vlcek J. J Phys D. 22:1989;623.
30. Abril I. Comput Phys Commun. 51:1988;413.
31. Carman R.J. J Phys D. 22:1989;55.
32. Kushner M.J. IEEE Trans Plasma Sci. 14:1986;188.
33. Donko Z., Rozsa K., Tobin R.C. J Phys D. 29:1996;105.
34. Surendra M., Graves D.B. IEEE Trans Plasma Sci. 19:1991;144.
35. Smith H.B., Charles C., Boswell R.W., Kuwahara H. J Appl Phys. 82:1997;561.
36. Surendra M., Graves D.B., Jellum G.M. Phys Rev A. 41:1990;1112.
37. Ventzek P.L.G., Hoekstra R.J., Sommerer T.J., Kushner M. J Appl Phys Lett. 63:1993;605.
38. Huang F.Y., Kushner M.J. J Appl Phys. 78:1995;5909.
39. Donko Z. Phys Rev E. 57:1998;7126.
40. Bogaerts A., van Straaten M., Gijbels R. Spectrochim Acta Part B. 50:1995;179.
41. Bogaerts A., Gijbels R., Goedheer W.J. J Appl Phys. 78:1996;2233.
42. Scharfetter D.L., Gummel H.K. IEEE Trans Electron Devices. 16:1969;64.
43. Bogaerts A., Gijbels R. J Appl Phys. 78:1995;6427.
44. Bogaerts A., Gijbels R., Vlcek J. J Appl Phys. 84:1998;121.
45. Matsunami N., Yamamura Y., Itikawa Y., Itoh N., Kazumata Y., Miyagawa S., Morita K., Shimizu R., Tawara H. At Data Nucl Data Tables. 31:1984;1-80.
46. Bogaerts A., van Straaten M., Gijbels R. J Appl Phys. 77:1995;1868.
47. Bogaerts A., Gijbels R., Carman R. J Spectrochim Acta Part B. 53:1998;1697.
48. Bogaerts A., Gijbels R. J Appl Phys. 79:1996;1279.
49. Bogaerts A., Gijbels R., Serikov V.V. J Appl Phys. 87:2000;8334.
50. Bogaerts A. Plasma Sources Sci Technol. 8:1999;210-229.
51. Bogaerts A., Gijbels R. J Anal At Spectrom. 13:1998;945-953.
52. Bogaerts A., Gijbels R. Plasma Phys Rep. 24:1998;621-632.
53. Bogaerts A., Wagner E., Smith B.W., Winefordner J.D., Pollmann D., Harrison W.W., Gijbels R. Spectrochim Acta Part B. 52:1997;205-218.
54. Bogaerts A., Gijbels R. Spectrochim Acta Part B. 52:1997;765.
55. Jonkers C. Ph.D. dissertation, University of Antwerp, Antwerp, 1995.
56. Bogaerts A., Gijbels R., Vlcek J. Spectrochim Acta Part B. 53:1998;1517.
57. Bogaerts A., Wilken L., Hoffmann V., Gijbels R., Wetzig K. Spectrochim Acta Part B. 56:2001;551-564.
58. Bogaerts A., Donko Z., Kutasi K., Bano G., Pinhao N., Pinheiro M. Spectrochim Acta Part B. 55:2000;1465-1479.
59. Donko Z., Bano G., Szalai L., Kutasi K., Rosza K., Pinheiro M., Pinhao N. J Phys D. 32:1999;2416-2425.
60. Baguer N., Bogaerts A., Gijbels R. Spectrochim Acta Part B. 57:2002;311-326.
61. Herrebout D., Bogaerts A., Yan M., Goedheer W.J., Dekempeneer E., Gijbels R. J Appl Phys. 90:2001;570-579.
62. Yan M., Goedheer W.J. J IEEE Trans Plasma Sci. 27:1999;1399.
63. Yan M., Goedheer W.J. J Plasma Sources Sci Technol. 8:1999;349.
64. Birdsall C.K. IEEE Trans Plasma Sci. 19:1991;65.
65. Yan M., Bogaerts A., Gijbels R., Goedheer W.J. J Appl Phys. 87:2000;3628.
66. Yan M., Bogaerts A., Gijbels R., Goedheer W.J. J Plasma Sources Sci Technol. 9:2000;583.
67. Yan M., Bogaerts A., Gijbels R., Goedheer W.J. J Phys Rev E. 63:2001;026405.
68. Yan M., Bogaerts A., Gijbels R., Goedheer W.J. J Phys Rev E. 65:2002;16408.
69. Yan M, Bogaerts A, Gijbels R. IEEE Trans Plasma Sci, in press.
70. Haverlag M., Kono A., Passchier D., Kroesen H.M.W., Goedheer W.J. J Appl Phys. 70:1991;3472.
71. Bacal M., Berlemont P.I., Bruneteau A.M., Leroy R., Stern R.A. J Appl Phys. 70:1991;1212.
72. Massines F., Gadri R.B., Decomps P., Rabehi A., Ségur P., Mayoux C. J Appl Phys. 83:1998;2950-2957.