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Volumn 517, Issue 23, 2009, Pages 6225-6229

Interpretation of the hydrogen evolution during deposition of microcrystalline silicon by chemical transport

Author keywords

Amorphous silicon; Ellipsometry; Hydrogen diffusion; Hydrogen plasma; Microcrystalline silicon

Indexed keywords

A-SI:H; CHEMICAL TRANSPORT; EX SITU; HYDROGEN DIFFUSION; HYDROGEN EVOLUTION; HYDROGEN PLASMA; HYDROGENATED AMORPHOUS SILICON (A-SI:H); HYDROGENATED MICROCRYSTALLINE SILICON; IN-SITU; OUT-DIFFUSION; PHOSPHORUS-DOPED; PLASMA EXPOSURE;

EID: 68349146630     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.072     Document Type: Article
Times cited : (10)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.