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Volumn 90, Issue 18-19, 2006, Pages 3385-3393
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Mechanism of hydrogen interaction with the growing silicon film
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Author keywords
Layer by layer deposition; Mass spectroscopy; Microcrystalline silicon; Thin film; VHF PECVD
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Indexed keywords
CRYSTALLINE MATERIALS;
ETCHING;
HYDROGEN;
REACTION KINETICS;
SILICON;
LAYER-BY-LAYER DEPOSITION;
MICROCRYSTALLINE SILICON;
VHF PECVD;
THIN FILMS;
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EID: 33748457518
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2005.10.025 Document Type: Article |
Times cited : (6)
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References (8)
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