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Volumn 5, Issue 10, 2008, Pages 3221-3228
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Multicrystalline silicon films with large grains on glass: Preparation and applications
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Author keywords
[No Author keywords available]
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Indexed keywords
GLASS SUBSTRATES;
GRAIN SIZE;
LARGE-GRAIN;
LASER IRRADIATIONS;
LASER MELTING;
MELTING TIME;
MULTI-CRYSTALLINE SILICON;
NUCLEATION RATE;
POLYCRYSTALLINE SILICON FILMS;
SOFTENING POINTS;
TEMPERATURE REGIMES;
THIN FILM SOLAR CELLS;
AMORPHOUS FILMS;
CRYSTALLIZATION;
FILM GROWTH;
FILM PREPARATION;
FLAT PANEL DISPLAYS;
GLASS;
GLASS LASERS;
GRAIN GROWTH;
GRAIN SIZE AND SHAPE;
GROWTH KINETICS;
METALLIC FILMS;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR LASERS;
SEMICONDUCTOR SWITCHES;
SUBSTRATES;
TECHNICAL PRESENTATIONS;
AMORPHOUS SILICON;
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EID: 68149156424
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200779509 Document Type: Conference Paper |
Times cited : (20)
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References (43)
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