Preparation of thick polycrystalline silicon layers on glass by laser irradiation

Thin Solid Films

Volumn 318, Issue 1-2, 1998, Pages 42-45

  Andra G ^a   Bergmann, J ^a   Falk, F ^a   Ose, E ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

Laser irradiation; Polycrystalline silicon layers; Rf CVD process

Indexed keywords

AMORPHOUS SILICON; ARGON; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; EXCIMER LASERS; GAS LASERS; GLASS; LASER PULSES; POLYCRYSTALLINE MATERIALS; SUBSTRATES; THIN FILM DEVICES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (CVD);

SILICON SOLAR CELLS;

EID: 0032046536     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01172-3     Document Type: Article

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