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Volumn 603, Issue 16, 2009, Pages 2594-2599

Atomic O and H exposure of C-covered and oxidized d-metal surfaces

Author keywords

ARPES; Chemical erosion; d Metals; Multilayers; Oxidation; Reduction

Indexed keywords

13.5 NM; ARPES; ATOMIC HYDROGEN; ATOMIC OXYGEN; CARBON COVERAGE; CARBON EROSION; CARBON SPECIES; CHEMICAL EROSION; D-METALS; METAL SURFACES; METALLIC STATE; NON-METALLIC; O RADICALS; OXIDATION AND REDUCTION; SUB-SURFACES;

EID: 68149144340     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2009.06.008     Document Type: Article
Times cited : (12)

References (29)
  • 12
    • 0034768869 scopus 로고    scopus 로고
    • L.E. Klebanoff, M.E. Malinowski, P.A. Grunow, W.M. Clift, C. Steinhaus, A.H. Leung, S.J. Haney, in: Emerging Lithographic Technologies V, Proc. SPIE 4343, 2001, 342.
    • L.E. Klebanoff, M.E. Malinowski, P.A. Grunow, W.M. Clift, C. Steinhaus, A.H. Leung, S.J. Haney, in: Emerging Lithographic Technologies V, Proc. SPIE 4343, 2001, 342.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.