Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature

Chinese Physics B

Volumn 18, Issue 2, 2009, Pages 773-777

  Jin Xiao, Wang ^a   Yan Li, Qin ^a   Heng Qing, Yan ^a   Ping Qi, Gao ^a   Jun Shuai, Li ^a   Min, Yin ^a   De Yan, He ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Columnar growth; Crystalline silicon films; Inductively coupled plasma CVD; Surface structure

Indexed keywords

COATED GLASS; COLUMNAR GRAIN; COLUMNAR GROWTH; CRYSTALLINE SILICON FILMS; EMISSION CHARACTERISTICS; FIELD ELECTRON EMISSIONS; INDUCTIVELY COUPLED PLASMA CVD; INDUCTIVELY-COUPLED; NANO-CONES; ROOM TEMPERATURE; SILICON FILMS; SOURCE GAS; THRESHOLD FIELD STRENGTH; UNIFORM DISTRIBUTION;

ALUMINUM; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTRON EMISSION; ELECTRONS; GLASS; METALLIC FILMS; MICROSTRUCTURE; PHOTORESISTS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE;

INDUCTIVELY COUPLED PLASMA;

EID: 67650709146     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/18/2/060     Document Type: Article

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