Fabrication of high growth rate solar-cell-quality μc-Si:H thin films by VHF-PECVD

Chinese Physics

Volumn 13, Issue 8, 2004, Pages 1370-1374

  Zhang, Xiao Dan ^a   Zhao, Ying ^a   Zhu, Feng ^a   Sun, Jian ^a   Wei, Chang Chun ^a   Hou, Guo Fu ^a   Geng, Xin Hua ^a   Xiong, Shao Zhen ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Device quality microcrystalline silicon; Raman spectroscopy; VHF PECVD; XRD

Indexed keywords

CRYSTAL ORIENTATION; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILANES; SOLAR CELLS; THERMAL EFFECTS; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

DEVICE-QUALITY MICROCRYSTALLINE SILICON; VERY HIGH FREQUENCY (VHF); VHF-PECVD; XRD;

THIN FILMS;

EID: 23344449508     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/13/8/034     Document Type: Article

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