Electron microscopic characterization of microcrystalline silicon thin films deposited by ECR-CVD

Thin Solid Films

Volumn 403-404, Issue , 2002, Pages 543-548

  Sieber, I ^a   Wanderka, N ^a   Kaiser, I ^a   Fuhs, W ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

ECR CVD; Electron microscopy; Microcrystalline silicon; Structural properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; EPITAXIAL GROWTH; SCANNING ELECTRON MICROSCOPY; SILICON; SINGLE CRYSTALS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

MICROCRYSTALLINE SILICON;

THIN FILMS;

EID: 0036467641     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01651-0     Document Type: Conference Paper

References (11)