Study of Polycrystalline Silicon Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of the Korean Physical Society

Volumn 39, Issue 1, 2001, Pages 123-126

  Won, Sung Hwan ^a   Youn, Jae Hyung ^a   Jang, Jin ^a   Moon, Byeong Yeon ^b  

^a Kyung Hee University   (South Korea)

^b Kyungwoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035627135     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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