Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 4, 2009, Pages 813-817

  Shinohara, Masanori ^a   Cho, Ken ^a,c   Matsuda, Yoshinobu ^a   Inayoshi, Takanori ^a   Kawazoe, Hiroki ^a   Fujiyama, Hiroshi ^a   Nitta, Yuuki ^b   Nakatani, Tatsuyuki ^b  

^a NAGASAKI UNIVERSITY   (Japan)

^b Toyo Advanced Technologies Co Ltd   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GAS-PHASE REACTIONS; GROWTH MODES; HIGH TEMPERATURE; IN-SITU; LOW SUBSTRATE TEMPERATURE; MULTIPLE INTERNAL REFLECTION GEOMETRIES; SUBSTRATE TEMPERATURE; SUBSTRATE TEMPERATURE EFFECT;

AMORPHOUS CARBON; CARBON FILMS; DEPOSITION RATES; INFRARED SPECTROSCOPY; MOLECULAR BEAM EPITAXY; SPECTROSCOPIC ANALYSIS; SUBSTRATES; TEMPERATURE; THERMAL EFFECTS;

FILM GROWTH;

EID: 67650305937     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3077278     Document Type: Article

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