Inductively coupled r.f. plasma assisted chemical vapour deposition of diamond-like carbon coatings

Diamond and Related Materials

Volumn 8, Issue 7, 1999, Pages 1193-1197

  Vanhulsel, A ^a   Celis, J P ^a   Dekempeneer, E ^b   Meneve, J ^b   Smeets, J ^b   Vercammen, K ^b  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b FLEMISH INSTITUTE FOR TECHNOLOGICAL RESEARCH VITO   (Belgium)

Author keywords

Chemical vapour deposition; Diamond like carbon; Inductively coupled r.f. plasma; Methane

Indexed keywords

CARBON; COOLING; DISSOCIATION; ELASTIC MODULI; ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; MASS SPECTROMETRY; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SUBSTRATES;

DIAMOND LIKE CARBON COATINGS; INDUCTIVELY COUPLED PLASMA SYSTEM; NANO INDENTATION; REMOTE PLASMA SOURCE; STRUCTURAL PROPERTIES;

COATINGS;

EID: 0033165507     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00113-2     Document Type: Article

References (32)

1. Dekempeneer E.H.A., Jacobs R., Smeets J., Meneve J., Eersels L., Blanpain B., Roos J., Oostra D.J. Thin Solid Films. 217:1992;56-61.
2. A. Vanhulsel, B. Blanpain, J.-P. Celis, E. Dekempeneer, J. Smeets, Surf. Coat. Technol., in press.
3. Köhler K., Coburn J.W., Horne D.E., Kay E., Keller J.H. J. Appl. Phys. 57:(1):1985;59-66.
4. Koidl P., Wild C., Dischler B., Wagner J., Ramsteiner M. Mater. Sci. Forum. 52-53:1989;41-70.
5. Grill A., Patel V., Meyerson B.S. J. Mater. Res. 5:(11):1990;2531-2537.
6. Blanpain B., Celis J.-P., Roos J.R., Ebberink J., Smeets J. Thin Solid Films. 223:1993;65-71.
7. Mutsukura N., Inoue S., Machi Y. J. Appl. Phys. 72:(1):1992;43-53.
8. Callegari A., Buchanan D.A., Hovel H., Simonyl E., Marwick A., Lustig N.E. Appl. Phys. Lett. 65:(25):1994;3200-3202.
9. Suzuki K., Ninomiya K., Nishimatsu S., Okudaira S. J. Vac. Sci. Technol. B. 3:1985;1025.
10. Popov O.A. J. Vac. Sci. Technol. A. 9:1989;711.
11. Reinke P., Jacob W., Möller W. J. Appl. Phys. 74:(2):1993;1354-1361.
12. Maruyama K., Inoue T., Yamamoto M., Morinaga T., Saitoh H., Kamata K. J. Mater. Sci. Lett. 13:1994;1793-1796.
13. Stevens J.E., Sowa M.J., Cecchi J.L. J. Vac. Sci. Technol. A. 13:(5):1995;2476-2482.
14. Keller J.H., Forster J.C., Barnes M.S. J. Vac. Sci. Technol. A. 11:(5):1993;2487-2491.
15. Pappas D.L., Hopwood J. J. Vac. Sci. Technol. A. 12:(4):1994;1576-1582.
16. Lai C., Brunmeier B., Woods R.C. J. Vac. Sci. Technol. A. 13:(4):1995;2086-2092.
17. Hopwood J., Guarnieri C.R., Whitehair S.J., Cuomo J.J. J. Vac. Sci. Technol. A. 11:(1):1993;147-151.
18. Vahedi V., Lieberman M.A., Dipeso G., Rognlien T.D., Hewett D. J. Appl. Phys. 78:(3):1995;1446-1458.
19. Ventzek P.L.G., Hoekstra R.J., Kushner M.J. J. Vac. Sci. Technol. B. 12:(1):1994;461-477.
20. Lee J.H., Lee Y.H. J. Appl. Phys. 79:(10):1996;7676-7681.
21. Hopwood J. Plasma Sources Sci. Technol. 3:1994;460-464.
22. Dekempeneer E.H.A., Smeets J., Meneve J., Eersels L., Jacobs R. Thin Solid Films. 241:1994;269-273.
23. Catherine Y., Turban G., Grolleau B. Plasma Chem. Plasma Process. 2:(1):1982;81-93.
24. Dekempeneer E.H.A., Meneve J., Kuypers S., Smeets J. Surf. Coat. Technol. 74-75:1995;399-404.
25. B. Dischler, Proc. Eur. Mater. Res. Soc. Meet., June 1987, p. 189.
26. Kersten H., Kroesen G. J. Vac. Sci. Technol. A. 8:(1):1990;38-42.
27. von Keudell A., Jacob W. J. Appl. Phys. 79:(2):1996;1092-1098.
28. Möller W. Appl. Phys. A. 56:1993;527-546.
29. Dagel D.J., Mallouris C.M., Doyle J.R. J. Appl. Phys. 79:(11):1996;8735-8747.
30. Tamor M.A., Vassell W.C., Carduner K.R. Appl. Phys. Lett. 58:(6):1991;592-594.
31. Tamor M.A., Vassell W.C. J. Appl. Phys. 76:(6):1994;3826.
32. Scheibe H.J., Drescher D., Alers P. Fresenius J. Anal. Chem. 353:1995;695-697.