Deposition of hydrogenated carbon film in a magnetically confined CH4 rf discharge

Vacuum

Volumn 56, Issue 2, 2000, Pages 129-132

  Mutsukura, Nobuki ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CARBON; DESORPTION; ELECTRIC DISCHARGES; ETCHING; FILM GROWTH; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; METHANE; PLASMA CONFINEMENT; SPUTTER DEPOSITION;

DIAMOND-LIKE CARBON FILMS; HYDROGENATED CARBON FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033881824     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00180-3     Document Type: Article

References (16)

1. Kline LE, Partlow WD, Bies WE. J Appl Phys 1989;65:70.
2. Mutsukura N, Inoue S, Machi Y. J Appl Phys 1992;72:43.
3. Naito S, Ito N, Hattori T, Goto T. Jpn J Appl Phys 1994;33: 5967.
4. Zou JW, Reichelt K, Schmidt K, Dischler B. J Appl Phys 1989;65:3914.
5. Mutsukura N, Miyatani K. Diamond Relat Mater 1995;4:342.
6. Mutsukura N, Yoshida K. Diamond Relat Mater 1996;5:919.
7. Moller W. Appl Phys 1993;A56:527.
8. von Keudell A, Moller W. J Appl Phys 1994;75:7718.
9. Gogolides E. Jpn J Appl Phys 1997;36:2435.
10. Kobayashi K, Mutsukura N, Machi Y. Vacuum 1991;42:741.
11. Mutsukura N, Saitoh K. J Vac Sci Technol 1996;A14:2666.
12. Kersten H, Kroesen GMW. J Vac Sci Technol 1990;A8:38.
13. Deutsch H, Kersten H, Klagge S, Rutscher A. Contrib Plasma Phys 1988;28:149.
14. Prutton M. Surface Physics. Cambridge: Oxford University Press, 1975.
15. Moller W, Fukarek W, von Keudell A, Lange K. Proceedings of the Symposium on Dry Process, Tokyo, November 1994.
16. Dekempeneer EHA, Smeets J, Meneve J, Eersels L, Jacobs R. Thin Solid Films 1994;241:269.