Direct growth of transparent conducting Nb-doped anatase TiO2 polycrystalline films on glass

Journal of Applied Physics

Volumn 105, Issue 12, 2009, Pages

  Yamada, Naoomi ^a   Hitosugi, Taro ^a,b   Kasai, Junpei ^a   Hoang, Ngoc Lam Huong ^a,c   Nakao, Shoichiro ^a,c   Hirose, Yasushi ^a,c   Shimada, Toshihiro ^a,c   Hasegawa, Tetsuya ^a,c  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; ANATASE TIO; CRYSTALLINITY; DIRECT GROWTH; EPITAXIAL STABILIZATION; GLASS SURFACES; LATTICE-MATCHED SUBSTRATES; LOW RESISTIVITY; OPTICAL ABSORPTION; ORDER OF MAGNITUDE; OXYGEN ATMOSPHERE; POLYCRYSTALLINE FILM; POST DEPOSITION TREATMENT; REDUCING ATMOSPHERE; RUTILE PHASE; SEED LAYER; VISIBLE REGION;

CONDUCTIVE FILMS; EPITAXIAL GROWTH; GLASS; NIOBIUM; OXIDE MINERALS; OXYGEN; TITANIUM DIOXIDE; TITANIUM OXIDES;

EPITAXIAL FILMS;

EID: 67650227390     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3148267     Document Type: Conference Paper

References (30)

1. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. 86, 252101 (2005). 10.1063/1.1949728
2. T. Hitosugi, Y. Furubayashi, A. Ueda, K. Itabashi, K. Inaba, Y. Hirose, G. Kinoda, Y. Yamamoto, T. Shimada, and T. Hasegawa, Jpn. J. Appl. Phys., Part 2 44, L1063 (2005). 10.1143/JJAP.44.L1063
3. D. S. Ginley and C. Bright, MRS Bull. 25, 15 (2000).
4. D. Kurita, S. Ohta, K. Sugiura, H. Ohta, and K. Koumoto, J. Appl. Phys. 100, 096105 (2006). 10.1063/1.2362990
5. S. X. Zhang, D. C. Kundaliya, W. Yu, S. Dhar, S. Y. Young, L. G. Salamanca-Riba, S. B. Ogale, R. D. Vispute, and T. Venkatesan, J. Appl. Phys. 102, 013701 (2007). 10.1063/1.2750407
6. S. X. Zhang, S. Dhar, W. Yu, H. Xu, S. B. Ogale, and T. Venkatesan, Appl. Phys. Lett. 91, 112113 (2007). 10.1063/1.2785152
7. M. S. Dabney, M. F. A. M. van Hest, C. W. Teplin, S. P. Arenkiel, J. D. Perkins, and D. S. Ginley, Thin Solid Films 516, 4133 (2008). 10.1016/j.tsf.2007.10.093
8. M. A. Gillispie, M. F. A. M. van Hest, M. S. Dabney, J. D. Perkins, and D. S. Ginley, J. Appl. Phys. 101, 033125 (2007). 10.1063/1.2434005
9. T. Hitosugi, A. Ueda, S. Nakao, N. Yamada, Y. Furubayashi, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. 90, 212106 (2007). 10.1063/1.2742310
10. N. Yamada, T. Hitosugi, N. L. H. Hoang, Y. Furubayashi, Y. Hirose, T. Shimada, and T. Hasegawa, Jpn. J. Appl. Phys., Part 1 46, 5275 (2007). 10.1143/JJAP.46.5275
11. N. Yamada, T. Hitosugi, N. L. H. Hoang, Y. Furubayashi, Y. Hirose, S. Konuma, T. Shimada, and T. Hasegawa, Thin Solid Films 516, 5754 (2008). 10.1016/j.tsf.2007.10.036
12. Y. Sato, H. Akizuki, T. Kamiyama, and Y. Shigesato, Thin Solid Films 516, 5758 (2008). 10.1016/j.tsf.2007.10.047
13. N. L. Hoang, N. Yamada, T. Hitosugi, J. Kasai, S. Nakao, T. Shimada, and T. Hasegawa, Appl. Phys. Express 1, 115001 (2008). 10.1143/APEX.1.115001
14. T. Hitosugi, A. Ueda, Y. Furubayashi, Y. Hirose, S. Konuma, T. Shimada, and T. Hasegawa, Jpn. J. Appl. Phys., Part 2 46, L86 (2007). 10.1143/JJAP.46.L86
15. M. A. Gillispie, M. F. A. M. van Hest, M. S. Dabney, J. D. Perkins, and D. S. Ginley, J. Mater. Res. 22, 2832 (2007). 10.1557/jmr.2007.0353
16. N. Sba, J. Perríre, B. Gallas, E. Millon, W. Seiler, and M. C. Bernard, J. Appl. Phys. 104, 033529 (2008). 10.1063/1.2964114
17. Y. Furubayashi, T. Hitosugi, and T. Hasegawa, Appl. Phys. Lett. 88, 226103 (2006). 10.1063/1.2208448
18. H. P. R. Frederiske, J. Appl. Phys. 32, 2211 (1961). 10.1063/1.1777045
19. Y. Furubayashi, N. Yamada, Y. Hirose, Y. Yamamoto, M. Otani, T. Hitosugi, T. Shimada, and T. Hasegawa, J. Appl. Phys. 101, 093705 (2007). 10.1063/1.2721748
20. S. Na-Phattalung, M. F. Smith, K. Kim, M.-H. Du, S.-H. Wei, S. B. Zhang, and S. Limpijumnong, Phys. Rev. B 73, 125205 (2006). 10.1103/PhysRevB.73.125205
21. H. Nogawa, T. Hitosugi, H. Kamisaka, K. Yamashita, A. Chikamatsu, K. Yoshimatsu, H. Kumigashira, M. Oshima, S. Nakao, Y. Furubayashi, Y. Hirose, T. Shimada, and T. Hasegawa, Mater. Res. Soc. Symp. Proc. 1074, 1074-I05-08 (2008).
22. D. Wicaksana, A. Kobayashi, and A. Kinbara, J. Vac. Sci. Technol. A 10, 1479 (1992). 10.1116/1.578269
23. H. Tang, K. Prasad, R. Sanjiǹs, P. E. Schmid, and F. Ĺvy, J. Appl. Phys. 75, 2042 (1994). 10.1063/1.356306
24. T. Sakai, Y. Kuniyoshi, W. Aoki, S. Ezoe, T. Endo, and Y. Hoshi, Jpn. J. Appl. Phys. 47, 6548 (2008). 10.1143/JJAP.47.6548
25. S. Schller, G. Beister, W. Sieber, G. Schirmer, and E. Hacker, Thin Solid Films 83, 239 (1981). 10.1016/0040-6090(81)90673-8
26. P. Sheng, Phys. Rev. B 21, 2180 (1980). 10.1103/PhysRevB.21.2180
27. P. Sheng, E. K. Sichel, and J. I. Gittleman, Phys. Rev. Lett. 40, 1197 (1978). 10.1103/PhysRevLett.40.1197
28. X. X. Zhang, H. Liu, K. K. Fung, and B. X. Qin, Physica B 279, 189 (2000).
29. A. Rothschild, Y. Komem, A. Levakov, N. Ashkenasy, and Y. Shapira, Appl. Phys. Lett. 82, 574 (2003). 10.1063/1.1539556
30. G. E. Jellison, Jr., L. A. Boatner, J. D. Budai, B.-S. Jeong, and D. P. Norton, J. Appl. Phys. 93, 9537 (2003). 10.1063/1.1573737