SCOPUS 정보 검색 플랫폼

Volumn 1, Issue 11, 2008, Pages 1150011-1150013

Low-temperature fabrication of transparent conducting anatase Nb-doped TiO2 films by sputtering

(7) Hoang, Ngoc Lam Huong a Yamada, Naoomi b Hitosugi, Taro b,c Kasai, Junpei b Nakao, Shoichiro b Shimada, Toshihiro a,b Hasegawa, Tetsuya a,b

a UNIVERSITY OF TOKYO (Japan)

b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (Japan)

c TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CONDUCTIVE FILMS; CRYSTALLIZATION; GLASS; GLASS TRANSITION; NANOCRYSTALLINE ALLOYS; NIOBIUM; OXYGEN; POLYMERS; TITANIUM DIOXIDE; TITANIUM OXIDES;

BOTTOM LAYERS; CRYSTALLINITY; CRYSTALLIZATION TEMPERATURES; POLYCRYSTALLINE FILMS; REDUCING ATMOSPHERES; ROOM TEMPERATURES; SEED LAYERS; TRANSITION TEMPERATURES; TRANSPARENT CONDUCTING; VISIBLE REGIONS;

AMORPHOUS FILMS;

EID: 57649093205 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.1.115001 Document Type: Article

Times cited : (43)

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