Transparent conductive Nb-doped TiO2 films deposited by direct-current magnetron sputtering using a TiO2 - x target

Thin Solid Films

Volumn 516, Issue 17, 2008, Pages 5758-5762

  Sato, Yasushi ^a   Akizuki, Hideo ^a   Kamiyama, Toshihisa ^b   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b AGC Ceramics Co Ltd   (Japan)

Author keywords

dc magnetron sputtering; Nb doped TiO2; TiO2 x target; TiO2 (anatase); Transparent conductive oxide

Indexed keywords

CARRIER CONCENTRATION; CRYSTALLIZATION; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; TITANIUM DIOXIDE;

POLYCRYSTALLINE ANATASE; TRANSPARENT CONDUCTIVE OXIDE;

THIN FILMS;

EID: 44249119912     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.047     Document Type: Article

References (18)

1. Furubayashi Y., Hitosugi T., Yamamoto Y., Inaba K., Kinoda G., Hirose Y., Shimada T., and Hasegawa T. Appl. Phys. Lett. 86 (2005) 252101
2. Furubayashi Y., Hitosugi T., Yamamoto Y., Hirose Y., Inaba K., Kinoda G., Shimada T., and Hasegawa T. Thin Solid Films 496 (2006) 157
3. Gillispie M.A., van Hest M.F.A.M., Dabney M.S., Perkins J.D., and Ginley D.S. J. Appl. Phys. 101 (2007) 033125
4. Hitosugi T., Ueda A., Furubayashi Y., Hirose Y., Konuma S., Shimada T., and Hasegawa T. Jpn. J. Appl. Phys. 46 (2006) L86
5. Hitosugi T., Ueda A., Nakao S., Yamada N., Furubayashi Y., Hirose Y., Shimada T., and Hasegawa T. Appl. Phys. Lett. 90 (2007) 212106
6. Ohsaki H., Tachibana Y., Hayashi A., Mitsui A., and Hayashi Y. Thin Solid Films 351 (1999) 57
7. Ohsaki H., Tachibana Y., Mitsui A., Kamiyama T., and Hayashi Y. Thin Solid Films 392 (2001) 169
8. In: Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilenberg G.E. (Eds). Handbook of X-ray Photoelectron Spectroscopy (1978), Perkin-Elmer Corp., Eden Prairie, MN
9. Shannon R.D. Acta Crystallogr. A32 (1976) 751
10. Shigesato Y., and Paine D.C. Appl. Phys. Lett. 62 (1993) 1268
11. Shigesato Y., Hayashi Y., and Haranoh T. Appl. Phys. Lett. 61 (1992) 73
12. Shigesato Y., Paine D.C., and Haynes T.E. J. Appl. Phys. 73 (1993) 3805
13. Hamberg I., and Granqvist C.G. J. Appl. Phys. 60 (1986) 123
14. Tang H., Berger H., Schmid P.E., and Lévy F. Solid State Commun. 92 (1994) 267
15. Kurita D., Ohta S., Sugiura K., Ohta H., and Koumoto K. J. Appl. Phys. 100 (2006) 096105
16. Yamagishi M., Kuriki S., Song P.K., and Shigesato Y. Thin Solid Films 442 (2003) 227
17. Ohno S., Sato D., Kon M., Sato Y., Yoshikawa M., Frach P., and Shigesato Y. Jpn. J. Appl. Phys. 43 (2004) 8234
18. Ohno S., Takasawa N., Sato Y., Yoshikawa M., Suzuki K., Frach P., and Shigesato Y. Thin Solid Films 496 (2006) 126