Spectral enhancement of a Xe-based EUV discharge plasma source

Plasma Sources Science and Technology

Volumn 18, Issue 2, 2009, Pages

  Zuppella, P ^a   Reale, A ^a   Ritucci, A ^a   Tucceri, P ^a   Prezioso, S ^a   Flora, F ^b   Mezi, L ^b   Dunne, P ^c  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b ENEA   (Italy)

^c UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE PLASMA; EXTREME ULTRAVIOLETS; INDIUM IONS; SPECTRAL ENHANCEMENT;

IONS; POWER SPECTRUM; ULTRAVIOLET DEVICES; XENON;

EMISSION SPECTROSCOPY;

EID: 67649835969     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/2/025014     Document Type: Article

References (16)

1. Bait S, Alameda J B, Barbee T W, Clift W M, Folta J A, Kaufmann B B and Spiller E A 2001 Improved reflectance and stability of Mo/Si multilayers 2001 Proc. SPIE 4506 65
2. Bowering N, Martins M, Partlo W N and Fomenkov I V 2004 Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations J. Appl. Phys. 95 16
3. 10 configurations of Xe X and some highly excited levels of Xe VIII and Xe IX Ions Phys. Scr. 65 40-45 (Pubitemid 34047723)
4. Churilov S S, Yoshi Y N and Reader J 2003 High-resolution spectrum of xenon ions at 13.4 nm Opt. Lett. 28 1478-80
5. D'Arcy R D, Costello J T, Kennedy E T, McGuinness C, Mosnier J P and O'Sullivan G 2000 The evolution of 4d photoabsorption in Sb with increasing ionization J. Phys. B: At. Mol. Opt. Phys. 33 1383-401
6. Fahy K et al 2004 UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT J. Phys D: Appl. Phys. 37 3225-32
7. Flora F, Mezi L, Bollanti S, Bonfigli F, Di Lazzaro P, Letardi T and En Zheng C 2001a Krypton as filter for ions, debris, and useless radiation in EUV projection lithography systems Proc. SPIE 4504 77-86 (Pubitemid 35153144)
8. Flora F, Mezi L, Zheng C E and Bonfigli F 2001b Krypton as a stopper for ions and small debris in laser produced plasma sources Europhys. Lett. 56 676
9. Klosner M A and Silfvast W T 2000 Xenon-emission-spectra identification in the 5-20 nm spectral region in highly ionized xenon capillary-discharge plasma J. Opt. Soc. Am. B 17 1279-90
10. Lysaght M, Kilbane D, Murphy N, Cummings A, Dunne P and O'Sullivan G 2005 Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography Phys. Rev. A 72 014502
11. Mandlebaum P, Finkenthall M, Schwob J L and Klapisch M 1987 Interpretation of the quasicontinuum band emitted by highly ionized rare-earth elements in the 70-100 range Phys. Rev. A 35 5051
12. Masnavi M, Nakajima M, Hotta E, Horioka K, Niimi G and A. Sasaki A 2007 Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources J. Appl. Phys. 101 033306
13. Ritucci A et al 2006 Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam Opt. Lett. 31 68-70 16419880 (Pubitemid 43133283)
14. Stamm U 2004 Extreme ultraviolet light sources for use in semiconductor lithography-state of the art and future development J. Phys. D: Appl. Phys. 37 3244-53
15. Svendsen W and O'Sullivan G 1994 Statistics and characteristics of xuv transition arrays from laser-produced plasmas of the elements tin through iodine Phys. Rev. A 50 3710-8
16. Wachulak P W, Capeluto M G, Marconi M C, Menoni C S and Rocca J J 2007 Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography Opt Express 15 3465