Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

Optics Letters

Volumn 31, Issue 1, 2006, Pages 68-70

  Ritucci, A ^a   Tomassetti, G ^a   Reale, A ^a   Arrizza, L ^a   Zuppella, P ^a   Reale, L ^a   Palladino, L ^a   Flora, F ^b   Bonfigli, F ^b   Faenov, A ^c   Pikuz, T ^c   Kaiser, J ^d   Nilsen, J ^e   Jankowski, A F ^e  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b ENEA   (Italy)

^c Multicharged Ions Spectra Data Center of VNIIFTRI   (Russian Federation)

^d BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^e LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; BANDGAP DIELECTRICS; FLUENCES; SOFT-X-RAY ARGON LASERS;

ARGON; CRYSTALS; DIELECTRIC MATERIALS; LASER OPTICS; X RAYS;

LASER ABLATION;

EID: 31144475268     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.31.000068     Document Type: Article

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