Influence of nitrogen on the growth and luminescence of silicon nanocrystals embedded in silica

Journal of Applied Physics

Volumn 105, Issue 1, 2009, Pages

  Bolduc, M ^a   Genard, G ^b   Yedji, M ^a   Barba, D ^a   Martin, F ^a   Terwagne, G ^b   Ross, G G ^a  

^a INRS EMT   (Canada)

^b UNIVERSITY OF NAMUR   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FRACTIONS; DEPTH PROFILE; NITROGEN ATOM; NITROGEN CONCENTRATIONS; NITROGEN ENVIRONMENT; PHOTOLUMINESCENCE EMISSION; PL EMISSION; PL INTENSITY; RAMAN SIGNAL; RAMAN SPECTRA; RESONANT NUCLEAR REACTION ANALYSIS (R-NRA); SILICON NANOCRYSTALS; VIBRATION SIGNAL;

ANNEALING; ARGON; ATOMS; CONCENTRATION (PROCESS); EMISSION SPECTROSCOPY; NANOCLUSTERS; NANOCRYSTALS; NITROGEN; NUCLEAR REACTORS; PASSIVATION; RAMAN SPECTROSCOPY; SILICA; SILICON OXIDES;

SILICON;

EID: 67649818429     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3054561     Document Type: Article

References (39)

1. L. T. Canham, Appl. Phys. Lett. 0003-6951 10.1063/1.103561 57, 1046 (1990); A. G. Cullis, L. T. Canham, and P. D. Calcott, J. Appl. Phys. 0021-8979 10.1063/1.366536 82, 909 (1997).
2. D. J. DiMaria, J. R. Kirtley, E. J. Pakulis, D. W. Dong, T. S. Kuan, F. L. Pesavento, T. N. Theis, and J. A. Cutro, J. Appl. Phys. 0021-8979 10.1063/1.333979 56, 401 (1984).
3. S. Hayashi, T. Nagareda, Y. Kanzawa, and K. Yamamoto, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.32.3840 32, 3840 (1993).
4. S. Cheylan, N. B. Manson, and R. G. Elliman, J. Lumin. 80, 213 (1998). 0022-2313
5. S. Cheylan and R. G. Elliman, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/S0168-583X(98)00771-X 148, 986 (1999).
6. T. Shimizu-Iwayama, K. Fujita, S. Nakao, K. Saitoh, T. Fujita, and N. Itoh, J. Appl. Phys. 0021-8979 10.1063/1.357031 75, 7779 (1994).
7. T. Komoda, J. P. Kelly, R. M. Gwilliam, P. L. F. Hemment, and B. J. Sealy, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/0168-583X(95)01002- 5 112, 219 (1996).
8. B. Garrido, M. López, S. Ferŕ, A. Romano-Rodríguez, A. Ṕrez-Rodríguez, P. Ruterana, and J. R. Morante, Nucl. Instrum. Methods Phys. Res. B 120, 101 (1996).
9. F. Koch and V. Petrova-Koch, J. Non-Cryst. Solids 198-200, 840 (1996). 0022-3093
10. S. M. Orbons, M. G. Spooner, and R. G. Elliman, J. Appl. Phys. 0021-8979 10.1063/1.1790058 96, 4650 (2004).
11. V. Mulloni, P. Bellutti, and L. Vanzetti, Surf. Sci. 0039-6028 10.1016/j.susc.2005.03.059 585, 137 (2005).
12. A. R. Wilkinson and R. G. Elliman, J. Appl. Phys. 0021-8979 10.1063/1.1789265 96, 4018 (2004).
13. Supplied by Universitywafer.com, 66 N Street, Unit #9, South Boston, MA 02127.
14. R. Smirani, F. Martin, G. Abel, Y. Q. Wang, M. Chicoine, and G. G. Ross, J. Lumin. 0022-2313 10.1016/j.jlumin.2005.02.021 115, 62 (2005).
15. D. Barba, F. Martin, C. Dahmoune, and G. G. Ross, Appl. Phys. Lett. 0003-6951 10.1063/1.2234739 89, 034107 (2006).
16. G. G. Ross and C. Śvigny, Nucl. Instrum. Methods Phys. Res. B 211, 351 (2003).
17. M. Yedji and G. G. Ross, J. Phys. D 39, 4429 (2006). 0022-3727
18. Purchased from Ion Beam Services: http://www.ion-beam-services.com/.
19. J. P. Biersack and J. F. Ziegler, SRIM-2006; http://www.srim.org.
20. D. Barba, F. Martin, and G. G. Ross, Nanotechnology 0957-4484 10.1088/0957-4484/19/11/115707 19, 115707 (2008).
21. C. R. Gossett, Nucl. Instrum. Methods Phys. Res. B 10-11, 722 (1985).
22. G. Genard, M. Yedji, G. G. Ross, and G. Terwagne, Nucl. Instrum. Methods Phys. Res. B 264, 156 (2007).
23. G. Terwagne, M. Piette, and F. Bodart, Nucl. Instrum. Methods Phys. Res. B 19-20, 145 (1987).
24. G. Terwagne, S. Lucas, and F. Bodart, Nucl. Instrum. Methods Phys. Res. B 66, 262 (1992).
25. H. B. Mak, G. T. Ewan, J. D. MacArthur, W. McLatchie, and R. E. Azuma, Nucl. Phys. A. 343, 79 (1980). 0375-9474
26. M. Yedji, M. Bolduc, G. Genard, G. Terwagne, and G. G. Ross, Nucl. Instrum. Methods Phys. Res. B 266, 2060 (2008).
27. Acćĺrateur Lińaire Tandetron pour l'Analyse et l'Implantation des Solides.
28. G. H. Li, K. Ding, Y. Chen, H. X. Han, and Z. P. Wang, J. Appl. Phys. 0021-8979 10.1063/1.373836 88, 1439 (2000).
29. H. Richter, Z. P. Wang, and L. Ley, Solid State Commun. 0038-1098 10.1016/0038-1098(81)90337-9 39, 625 (1981).
30. I. H. Campbell and P. M. Fauchet, Solid State Commun. 0038-1098 10.1016/0038-1098(86)90513-2 58, 739 (1986).
31. G. Faraci, S. Gibilisco, P. Russo, A. R. Pennisi, and S. La Rosa, Phys. Rev. B 0163-1829 10.1103/PhysRevB.73.033307 73, 033307 (2006).
32. Md. N. Islam, A. Pradhan, and S. Kumar, J. Appl. Phys. 0021-8979 10.1063/1.1980537 98, 024309 (2005).
33. M. Cardona, Phys. Status Solidi B 0370-1972 10.1002/1521-3951(200007)220: 1<5::AID-PSSB5>3.0.CO;2-K 220, 5 (2000).
34. B. K. Agrawal, P. S. Yadav, and B. K. Ghosh, J. Phys. C 0022-3719 10.1088/0022-3719/21/18/006 21, 3397 (1988).
35. M. Ribeiro, I. Pereyra, and M. I. Alayo, Thin Solid Films 426, 200 (2003).
36. S. I. Raider, R. A. Gdula, and R. Petrak, Appl. Phys. Lett. 0003-6951 10.1063/1.88389 27, 150 (1975).
37. M. L. Green, T. Sorsch, L. C. Feldman, W. N. Lennard, E. P. Gusev, E. Garfunkel, H. C. Lu, and T. Gustafsson, Appl. Phys. Lett. 0003-6951 10.1063/1.120235 71, 2978 (1997).
38. B. Tuttle, Phys. Rev. B 0163-1829 10.1103/PhysRevB.60.2631 60, 2631 (1999).
39. E. P. Gusev, H. C. Lu, T. Gustafsson, E. Garfunkel, M. L. Green, and D. Brasen, J. Appl. Phys. 0021-8979 10.1063/1.365858 82, 896 (1997).