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Volumn 148, Issue 1-4, 1999, Pages 986-990

The effect of ion dose and annealing ambient on room temperature photoluminescence from Si nanocrystals in SiO2

Author keywords

Ion implantation; Light emission; Nanocrystal; Photoluminescence; Photonics; Silica

Indexed keywords

ION DOSE; PHOTOLUMINESCENCE EMISSION INTENSITY;

EID: 0033513676     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00771-X     Document Type: Article
Times cited : (25)

References (14)
  • 3
    • 0004637032 scopus 로고    scopus 로고
    • Materials and devices for silicon-based optoelectronics
    • Materials Research Society
    • S. Coffa, A. Polman, R. Soref (Eds.), Materials and devices for silicon-based optoelectronics, Mat. Res. Soc. Symp. Proc. vol. 486, Materials Research Society, 1998.
    • (1998) Mat. Res. Soc. Symp. Proc. , vol.486
    • Coffa, S.1    Polman, A.2    Soref, R.3
  • 11
    • 9344245517 scopus 로고
    • Chapter entitled: Energy transfer in concentrated systems
    • J.D. Dunitz, J.B. Good-enough, P. Hemmerich, J.A. Ibers, C.K. Jorgensen, J.B. Neilands, D. Reinen, R. J.P. Williams (Eds.), Springer, New York
    • R.C. Powell, G. Blasse, Chapter entitled: energy transfer in concentrated systems, in: J.D. Dunitz, J.B. Good-enough, P. Hemmerich, J.A. Ibers, C.K. Jorgensen, J.B. Neilands, D. Reinen, R. J.P. Williams (Eds.), Structure and Bonding 42: Luminescence and Energy Transfer, Springer, New York, 1980.
    • (1980) Structure and Bonding 42: Luminescence and Energy Transfer
    • Powell, R.C.1    Blasse, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.