Evidence of localized amorphous silicon clustering from Raman depth-probing of silicon nanocrystals in fused silica

Nanotechnology

Volumn 19, Issue 11, 2008, Pages

  Barba, D ^a   Martin, F ^a   Ross, G G ^a  

^a INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CONCENTRATION (PROCESS); FUSED SILICA; PARTICLE SIZE; RAMAN SPECTROSCOPY;

LASER FOCUSING; MICRO-RAMAN SPECTROSCOPY; PHONON EXCITATION; SILICON NANOCRYSTALS;

NANOCRYSTALLINE SILICON;

NANOCRYSTAL; SILICON; SILICON DIOXIDE;

ARTICLE; IMPLANTATION; MOLECULAR DYNAMICS; MOLECULAR MODEL; PHONON; PRIORITY JOURNAL; RAMAN SPECTROMETRY;

EID: 42549103692     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/11/115707     Document Type: Article

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