XPS and SIMS investigation on the role of nitrogen in Si nanocrystals formation

Surface Science

Volumn 585, Issue 3, 2005, Pages 137-143

  Mulloni, V ^a   Bellutti, P ^a   Vanzetti, L ^a  

^a ITC IRST   (Italy)

Author keywords

Chemical vapor deposition; Clusters; Insulating films; Nitrogen atom; Oxidation; Photoelectron spectroscopy; Secondary ion mass spectrometry; Si nanocrystals; Silicon oxides

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; NITROGEN; OXIDATION; PHOTOLUMINESCENCE; SECONDARY ION MASS SPECTROMETRY; SILICA; SINGLE CRYSTALS; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

CLUSTERS; INSULATING FILMS; NITROGEN ATOMS; SI-NANOCRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 20344374963     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2005.03.059     Document Type: Article

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