Effect of electric charge accumulation on insulators during low energy ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 211, Issue 3, 2003, Pages 351-357

  Ross, G G ^a   Sevigny C ^a  

^a INRS EMT   (Canada)

Author keywords

Charge accumulation; Depth distribution; Insulator; Ion atom implantation; Low energy

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CHARGE; ELECTRIC FIELD EFFECTS; ELECTRIC INSULATORS; MONTE CARLO METHODS;

CHARGE ACCUMULATION;

ION IMPLANTATION;

EID: 0141894348     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)01387-9     Document Type: Article

References (15)

1. Rabalais J.W. Low Energy Ion-Surface Interactions. 1994;John Wiley & Sons, Chichester.
2. Liu F., Monteiro O.R., Yu K.M., Brown I.G. Nucl. Instr. and Meth. B. 132:1997;188.
3. Parilis E. Nucl. Instr. and Meth. B. 116:1996;478.
4. Torrisi A., Licciardello A., Ancarani V., Cantiano M., Puglisi O. Nucl. Instr. and Meth. B. 116:1996;342.
5. Mizutami T. J. Non-Cryst. Solids. 181:1995;123.
6. Ross G.G., Granger G., Gauthier M. Nucl. Instr. and Meth. B. 164-165:2000;324.
7. Chassé M., Ross G.G. Nucl. Instr. and Meth. B. 193:2002;835.
8. Ross G.G., Gauthier M. Nucl. Instr. and Meth. B. 193(1-4):2002;449.
9. Mittal K.L. Contact Angle, Wettability and Adhesion. 1993;VSP BV, Utrecht. Part 4.
10. Ross G.G., Leblanc L. Nucl. Instr. and Meth. B. 62:1992;484.
11. Schiettekatte F., Ross G.G. Duggan J.L. Application of Accelerators in Research and Industry. 1997;711 AIP Press, New York.
12. Schiettekatte F., Ross G.G., Chevarier A., Chevarier N., Plantier A. Nucl. Instr. and Meth. B. 132:1997;607.
13. Biersack J.P., Haggmark L.G. Nucl Instr and Meth. 174:1980;257.
14. Ziegler J.F., Biersack J.P., Littmark U. Ziegler J.F. The Stopping and Range of Ions in Solids. 1985;Pergamon Press, New York.
15. Chassé M., Ross G.G. J. Appl. Phys. 92(2):2002;5872.