Properties of nanostructured cubic boron nitride films prepared by the short-pulse laser plasma deposition techniques

International Journal of Refractory Metals and Hard Materials

Volumn 27, Issue 5, 2009, Pages 823-828

  Feng, P X ^a,b   Zhang, H X ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b DONGHUA UNIVERSITY   (China)

Author keywords

cBN thin films; Hardness; Raman

Indexed keywords

BOND STRUCTURES; CBN THIN FILMS; CHEMICAL COMPOSITIONS; CUBIC BORON NITRIDE FILMS; DEPOSITION TECHNIQUE; ENERGY DISPERSIVE SPECTRUM; FT-IR SPECTRUM; HARDNESS MEASUREMENT; HIGH POWER DENSITY; LASER DEPOSITIONS; LASER PLASMA; MOLYBDENUM SUBSTRATE; NANO-STRUCTURED; NANOROD ARRAYS; RAMAN; REDUCING POWER; SHORT-PULSE LASERS;

BORON; CHEMICAL VAPOR DEPOSITION; CUBIC BORON NITRIDE; ELECTRON ENERGY LOSS SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; MECHANICAL PROPERTIES; MOLYBDENUM; NANORODS; PLASMA DEPOSITION; PLASMA INTERACTIONS; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; THIN FILMS;

BORON NITRIDE;

EID: 67649597973     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2009.02.006     Document Type: Article

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