Reduced bias synthesis of cubic boron nitride thin films by magnetically enhanced inductively coupled radio frequency plasma chemical vapor deposition

Materials Letters

Volumn 57, Issue 8, 2003, Pages 1459-1463

  Chattopadhyay, K K ^a   Banerjee, A N ^a   Kundoo, S ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

Cubic boron nitride; CVD, chemical vapor deposition; FTIR, Fourier transformed infrared; Glancing angle XRD; Substrate bias

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CUBIC BORON NITRIDE; DOPING (ADDITIVES); FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION;

CUBIC PHASES;

THIN FILMS;

EID: 0037301916     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)01007-8     Document Type: Article

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