Characterization of CrBN films deposited by ion beam assisted deposition

Journal of Applied Physics

Volumn 91, Issue 3, 2002, Pages 1040-1045

  Aouadi, S M ^a   Namavar, F ^b   Tobin, E ^b   Finnegan, N ^c   Haasch, R T ^c   Nilchiani, R ^d   Turner, J A ^d   Rohde, S L ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b SPIRE CORPORATION   (United States)

^c University of Illinois at Urbana Champaign   (United States)

^d UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ELEMENTAL COMPOSITIONS; GRAIN SIZE; HARDNESS AND ELASTIC MODULUS; IN-SITU; IN-SITU ANALYSIS; INFRARED SPECTROSCOPIC ELLIPSOMETRY; LOW TEMPERATURES; NANO-HARDNESS TESTING; NANOCRYSTALLINES; POST-DEPOSITION; POTENTIAL TECHNIQUES; SILICON SUBSTRATES; TERNARY COMPOUNDS; TERNARY NITRIDE COATINGS; TERNARY NITRIDES; VISIBLE LIGHT; XRD;

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ION BEAM ASSISTED DEPOSITION; MECHANICAL PROPERTIES; NANOINDENTATION; NITRIDES; PHOTOELECTRONS; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COATINGS;

EID: 0036470592     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1426243     Document Type: Article

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