Influence of aluminum additions on phase formation in boron nitride films deposited by magnetron sputtering

Journal of Applied Physics

Volumn 93, Issue 4, 2003, Pages 2009-2014

  Pfeifer, Th ^a   Richter, F ^a   Welzel, Th ^a   Kupfer, H ^a   Willich, P ^b  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; BORON COMPOUNDS; ELECTRODES; MAGNETRON SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

PHASE FORMATION;

THIN FILMS;

EID: 0037443047     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1538322     Document Type: Article

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